Tetrahedral amorphous carbon films prepared by magnetron sputtering and dc ion plating

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Tetrahedral amorphous carbon films prepared by magnetron sputtering and dc ion plating

Highly tetrahedral, dense amorphous carbon ~ta-C! films have been deposited using rf sputtering of graphite by an unbalanced magnetron with intense dc Ar-ion plating at low temperatures ~,70 °C!. The ratio of the argon ion flux to neutral carbon flux F i/Fn is about 5. The film density and compressive stress are found to pass through a maximum of 2.7 g/cm and 16 GPa, respectively, at an ion pla...

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ژورنال

عنوان ژورنال: Journal of Applied Physics

سال: 1996

ISSN: 0021-8979,1089-7550

DOI: 10.1063/1.360979